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Evaluation of Device Materials (Chemical Solutions and Gases)

Analysis of trace impurities in high-purity chemical solutions and gases

We can analyze trace impurities in each type of process material used in the film forming process, such as special gases, by combining capture technology and pre-treatment technology to suit the sample. We also perform high-sensitivity analysis of the number of particles and impurities in high-purity chemicals for the electronics industry used in the semiconductor industry.

Features

We perform high-sensitivity analysis of trace impurities in high-purity chemicals using cleanrooms suited, respectively, to metal element analysis, ion component analysis, and organic material analysis.

Test Items

target materials compounds industrial applications target components analytical method
organometallic compounds compounds containing Ti, Zr and Al diffusion barrier layers, wire bonding, contact holes, vertical interconnect access metals ICP-MS、ICP-AES
halogens IC
metal hlides TiCl4, WF6 diffusion barrier layers, wire bonding, contact holes, vertical interconnect access, reflow liner metals ICP-MS、ICP-AES
corrosive gases TiCl4, WF6 diffusion barrier layer, cleaning metals ICP-MS、ICP-AES
halogens IC
inorganic gases H2, N2, Ar, He, Air concentration control, reagent gases, cleaning metals ICP-MS、ICP-AES
halogens IC
oils GC-MS
moisture dew point meter
particles particle counter
bacteria PCR
chemicals for semiconductor industry ultrapure water, ammonia solution, hydrogen peroxide, hydrofluoric acid cleaning particles, metals, halogens, TOC liquid particle counter, ICP-MS、IC、TOC

Technical News

Contact Us for Services

For inquiries and requests concerning services of analysis, measurements, products and consulting , please feel free to contact us via inquiry form or telephone/fax .

Telephone
+81-3-5689-1219
FAX
+81-3-5689-1222