Analysis of trace impurities in high-purity chemical solutions and gases
We can analyze trace impurities in each type of process material used in the film forming process, such as special gases, by combining capture technology and pre-treatment technology to suit the sample. We also perform high-sensitivity analysis of the number of particles and impurities in high-purity chemicals for the electronics industry used in the semiconductor industry.
We perform high-sensitivity analysis of trace impurities in high-purity chemicals using cleanrooms suited, respectively, to metal element analysis, ion component analysis, and organic material analysis.
|target materials||compounds||industrial applications||target components||analytical method|
|organometallic compounds||compounds containing Ti, Zr and Al||diffusion barrier layers, wire bonding, contact holes, vertical interconnect access||metals||ICP-MS、ICP-AES|
|metal hlides||TiCl4, WF6||diffusion barrier layers, wire bonding, contact holes, vertical interconnect access, reflow liner||metals||ICP-MS、ICP-AES|
|corrosive gases||TiCl4, WF6||diffusion barrier layer, cleaning||metals||ICP-MS、ICP-AES|
|inorganic gases||H2, N2, Ar, He, Air||concentration control, reagent gases, cleaning||metals||ICP-MS、ICP-AES|
|moisture||dew point meter|
|chemicals for semiconductor industry||ultrapure water, ammonia solution, hydrogen peroxide, hydrofluoric acid||cleaning||particles, metals, halogens, TOC||liquid particle counter, ICP-MS、IC、TOC|