Elemental Analysis / Composition Analysis｜Applications Classified by Techniques｜Technical Informations

We analyze purity of products and materials in manufacturing process, composition of impurity, exhaust gas and waste water in a wide range of industrial fields.

Absorption Spectrophotometer, Atomic Emission Spectrometer (AES), Atomic Absorption Spectrometer (AAS), Flame-AAS (FL-AAS), Inductively-Coupled Plasma Mass Spectrometer (ICP-MS), X-ray Fluorescence Spectrometer (XRF), Organic Elemental Analyzer, Glow Discharge Mass Spectrometer (GDMS), Particle Composition Analyzer, Automatic Trace Total Nitrogen Analyzer (TN), High-Sensitivity Carbon-Nitrogen Analyzer (NC）

Title	No.
Determination of Elemental Impurities in Drug Products in Compliance with ICH Q3D Guideline	NEW TN476
Characterization of Polymer Properties and Analysis of Polymer Additives	NEW TN068
Analysis of Building Materials by EPMA and XRD	NEW TN173
Analysis of Trace Metal Impurities in Electronic Chemicals	TN066
Ultra-trace Analysis of Metal Impurities in Non-silicon Thin Films on Silicon Wafers	TN187
Measurement of A Trace Amount of Organic and Inorganic Components in Exhaust Gases from Scrubbers	TN092
High Accuracy CHN Elemental Analysis	TN101
Analysis of Elements in Biological Samples by ICP-MS/ICP-AES	TN515
Living Environment Impact Assessment for Install of a Waste Treatment Facility	TN508
Comprehensive Analysis of Fuel Components and Trace Analysis of Sulfur Compounds	TN503
Chemical Analysis of Metallic Impurities in Fused Silica Materials	TN334
Separation and Structural Analysis of Organic Compounds	TN488
Determination of Inorganic Impurities in Graphite	TN027E
Determination of Ultratrace Impurities using Inductively Coupled Plasma Mass Spectrometry （ICP-MS）	TN051
Determination of Trace Nitrogen by Oxidative Combustion and Chemiluminescence	TN482
Determination of Carbon and Sulfur Content in Solid and Powder Sample - Infrared Absorption Method after Combustion -	TN480
Determination of Metallic Elements by Inductively Coupled Plasma Atomic Emission Spectrometry (ICP-AES)	TN023
Liquefied Petroleum Gas (LPG) Analysis	TN479
Evaluation of acidic and basic contaminants using solid active sampler BremS®	TN438
Analysis of Gases Confined in Sealed Space	TN425
Chemical Analysis of Trace Metal Contamination on φ450 mm Silicon Wafer Surface	TN410
Determination of Trace Impurities on Silicon Surface in Solar Cell	TN347
Analysis of Metallic Impurities in Limited Area of Silicon Wafer	TN335
Wafer Edge and Bevel Area Analysis Using the Horizontal Substrate Inspection Device	TN333
Phosphorus Analysis of Oxide Film on Silicon Wafer Surface by High Resolution Inductively Coupled Plasma Mass Spectrometry(HR-ICP-MS)	TN192
Determination of Trace Sulfur and Halogen in Organic Compounds	TN093
Composition Analysis of Printing Ink	TN069
Glow Discharge Mass Spectrometry	TN061
Determination of Inorganic Impurities in Highly Purified Quartz	TN050
Determination of impurities in fine ceramics	TN049
Evaluation Methods for Trace Impurities in Clean Room Air	TN045
Chemical Analysis of Boro-Phospho Silicate and Phospho Silicate Glasses	TN043
Chemical Analysis of Metallic Impurities on Silicon Wafer Surface	TN042
Oxide Thickness Determination by X-ray Photoelectron Spectroscopy　(XPS)	TN033
Characterization of Fine Substance on Silicon Wafer with Fourier Transform Infrared Microspectrometry（m-FT-IR）	TN028

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