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In the fields of electronic devices, such as semiconductor, LCD panels and hard disks, the machining dimensions have been reduced to microscopic levels, and the required cleanliness in the manufacturing environment has become higher. The relevant substances are called “molecular contaminants”. It is demanded to measure the ultra trace quantities of various chemical substances with high accuracy. We are able to evaluate the level of chemical contamination at all stages related to clean rooms and analyze the causes of the contamination. We are ready to support you in evaluation of construction equipment, construction materials, manufacturing raw materials and manufacturing equipment that may cause contamination through comprehensive analysis.

	Chemical contamination evaluation and analysis a. Clean room Analysis of chemical contamination of air in clean room Analysis of particles adhering on silicon wafers, glass and magnetic disk media b. Product Evaluation of silicon wafer contamination Analysis of FPD panel defects Analysis of contamination of HDD-related components c. Manufacturing equipment Transfer system Cleaning equipment Exposure equipment Film deposition system Etching equipment CMP equipment		Evaluation of silicon wafer contamination
	d. Fan filter unit (FFU) ULPA filter outgas test Evaluation of chemical filter performance (performance after removal, lifetime, etc.) FFU component material outgas test (motor, gaskets, etc.) e. Air conditioning equipment Analysis of removing performance and control of air washer and chemical filter Analysis of ducts, boilers and coils		f. Component materials Wall materials Sealing materials Floor materials Concrete Dust-proof sheets Adhesives g. Manufacturing raw materials Evaluation of cleanliness of high-purity gas Analysis of ultra trace impurities in high-purity chemicals Analysis of photoresist Analysis of sealing compounds

Sampling at customer’s premises

Air sampling kit

Wafer exposure test kit

Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

Thermal Desorption - Gas Chromatography - Mass Spectrometry (TD-GC-MS)

Wafer Thermal Desorption - Gas Chromatography - Mass Spectrometry (WTD-GC-MS)

Example of chemical contamination analysis

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